Gas Permeation through Nafion. Part 2: Resistor Network Model
Washington, DC / American Chemical Society (2015) [Journal Article]
The journal of physical chemistry / C
Volume: 119
Issue: 45
Page(s): 25156-25169
Authors
Authors
Schalenbach, Maximilian
Hoeh, Michael A.
Gostick, Jeff T.
Lueke, Wiebke
Stolten, Detlef
Identifier
- DOI: 10.1021/acs.jpcc.5b04157
- REPORT NUMBER: RWTH-2016-10369