Gas Permeation through Nafion. Part 2: Resistor Network Model
Schalenbach, Maximilian (Corresponding author); Hoeh, Michael A.; Gostick, Jeff T.; Lueke, Wiebke; Stolten, Detlef
Washington, DC / American Chemical Society (2015) [Journal Article]
The journal of physical chemistry / C
Volume: 119
Issue: 45
Page(s): 25156-25169
Identifier
- DOI: 10.1021/acs.jpcc.5b04157
- REPORT NUMBER: RWTH-2016-10369